NI increases channel density in semiconductor test push

NI has introduced a PXI-based source measure unit (SMU), which provides six times more DC channel density than its previous PXI SMUs for testing RF, MEMS, and mixed-signal and other analogue semiconductor components. According to Eric Starkloff, NI executive vice president of global sales and marketing, semiconductor test is “a strategic focus” and the company ...

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from Electronics Weekly https://www.electronicsweekly.com/news/ni-increases-channel-density-semiconductor-test-push-2018-02/