Within the next twelve months Toshiba will start introducing nano-imprint lithography (NIL) into its NAND manufacturing process, reports The Nikkei. The introduction of NIL in volume production in FY 2018 should reduce NAND production costs by 10%. NIL uses a stamp technique to form a layer of circuitry on the wafer. Toshiba has been working ...
Toshiba to introduce nanoimprimt process for NAND
from ElectronicsWeekly http://www.electronicsweekly.com/news/business/toshiba-to-introduce-nanoimprimt-process-for-nand-2016-06/
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