Tuesday, 26 July 2016

Novel wet etch makes better finfets

University of Illinois researchers have developed a way to wet-etch tall clean fins for finfets. It works for indium phosphide, but not for silicon – yet. The aim was to etch tall fins with vertical sides and few surface blemishes. “We use a technique that gives a much higher aspect ratio, and the sidewalls are ...

Novel wet etch makes better finfets



from ElectronicsWeekly http://www.electronicsweekly.com/news/research-news/novel-wet-etch-makes-better-finfets-2016-07/

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