Leti, the French semiconductor research institute, has teamed with Berlin-based Fraunhofer’s microelectronics group, to extend next generation CMOS technologies for Internet of Things, augmented reality, automotive, health and aeronautics. The will support the development of FD-SOI – fully depleted silicon on insulator – advanced semiconductor process technology in Europe. “The ability to, one, develop key ...
Read full article: French and German researchers collaborate on future chip technologies
from Electronics Weekly https://www.electronicsweekly.com/news/french-german-researchers-collaborate-future-chip-technologies-2017-06/
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