This week’s SPIE Advanced Lithography Conference brings hope on EUV. TSMC and Samsung said they are running EUV machines with an 80W light source and are getting 70% up-time compared with 95% for immersion steppers. TSMC says it is getting 500 wafers a day. It is installing a 125W ASML machine. 125W is seen as necessary to ...
Intel, Samsung, TSMC Run EUV With 80W Light Source
from ElectronicsWeekly http://www.electronicsweekly.com/blogs/mannerisms/manufacturing-mannerisms/intel-and-tsmc-run-euv-with-80w-light-source-2016-02/
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